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唐群星, 刘明东, 颜有仪, 等. HPLC-MS/MS分析盐酸头孢替安酯中未知杂质的结构[J]. 四川大学学报(医学版), 2013, 44(3): 481-484,493.
引用本文: 唐群星, 刘明东, 颜有仪, 等. HPLC-MS/MS分析盐酸头孢替安酯中未知杂质的结构[J]. 四川大学学报(医学版), 2013, 44(3): 481-484,493.
TANG Qun-xing, LIU Ming-dong, YAN You-yi, et al. Determination of Unknown Impurities in Cefotiam Hexetil by HPLC-MS/MS[J]. Journal of Sichuan University (Medical Sciences), 2013, 44(3): 481-484,493.
Citation: TANG Qun-xing, LIU Ming-dong, YAN You-yi, et al. Determination of Unknown Impurities in Cefotiam Hexetil by HPLC-MS/MS[J]. Journal of Sichuan University (Medical Sciences), 2013, 44(3): 481-484,493.

HPLC-MS/MS分析盐酸头孢替安酯中未知杂质的结构

Determination of Unknown Impurities in Cefotiam Hexetil by HPLC-MS/MS

  • 摘要: 目的 采用高效液相色谱-串联质谱联用(HPLC-MS/MS)对盐酸头孢替安酯原料药中的杂质进行结构解析。 方法 盐酸头孢替安酯原料药经去离子水溶解,采用HPLC-MS/MS技术进行分析。色谱柱为Agilent SB-C18柱(150 mm×2.1 mm,3.5 μm),流动相为0.1%甲酸溶液(A)-乙腈(B)(97:3),梯度洗脱,洗脱程序为t(min)/B (%):0/3、5/3、15/20、20/40、30/60、40/80,流速0.3 mL/min,检测波长254 nm,柱温40℃;离子源为电喷雾离子源(ESI),正离子MRM模式扫描,电离电压4 kV,锥孔电压100 V,质量扫描范围(m/z)为50~1000,雾化气为氮气,雾化气压力40 psi,干燥气温度350℃,干燥气流速10 L/min。 结果 通过对盐酸头孢替安酯和有关物质的液相色谱图以及液相色谱峰对应的质谱图分析归纳,推测盐酸头孢替安酯样品中有关物质1为Δ3-异构体,并解析了有关物质2中的3个杂质的结构。 结论 本法可灵敏、快速、准确地分离鉴定盐酸头孢替安酯中的有关物质,对盐酸头孢替安酯的质量控制有指导意义。

     

    Abstract: Objecitve To detect unknown impurities in raw drug material of cefotiam hexetil. Methods High performance liquid chromatography-tandem mass spectrometry (HPLC-MS/MS) was employed for the determination of impurities in cefotiam hexetil. Agilent SB-C18 column (150 mm×2.1 mm i.d., 3.5 μm particles) was used for chromatographic separations of cofotiam hexetil dissolved in deionized water, with mobile phase consisting of (A) 0.1% formic acid and (B) acetonitrile and timed gradient program T (min)/B (%):0/3, 5/3, 15/20, 20/40, 30/60, 40/80. The flow rate was set at 0.3 mL/min with DAD detector wavelength fixed at 254 nm. Electrospray ionization source was applied and operated in positive ion MRM mode. The source voltage was kept at 4 kV and cone voltage was 100 V with the mass range m/z 50-1000. Nitrogen was used as nebulizing gas and the nebulizer pressure was 40 psi. The drying gas temperature was 350℃ and the drying gas flow was 10 L/min. Results Unknown impurities of cefotiam hexetil were identified. Substance 1 was Δ3-isomer of cefotiam hexetil. The structures of 3 other substances were also determined. Conclusion The method is sensitive, rapid and credible for the analysis of cefotiam hexetil and its related impurities, which can be applied in quality control of cefotiam hexetil.

     

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